Measurement of Copper Drift in Methylsilsesquiazane-Methylsilsesquioxane Dielectric Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-04-30
著者
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KIKKAWA Takamaro
Research Center for Nanodevices and Systems, Hiroshima University
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吉川 公麿
広島大学:産業総合研究所
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Mukaigawa Seiji
Research Center For Nanodevices And Systems Hiroshima University
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Kikkawa Takamaro
Research Center For Nanodevices And Systems Hiroshima University
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Aoki T
Jamstec
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AOKI Tomoko
Tonen Corporation
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SHIMIZU Yasuo
Tonen Corporation
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Shimizu Y
Keio Univ. Yokohama Jpn
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Aoki Toshio
Tonen Corporation
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Kikkawa Takamaro
Millenium Research For Advanced Information Technology (mirai)-asrc Aist
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Kikkawa Takamaro
Research Center for Nanodevice and Systems (RCNS), Hiroshima University, Higashihiroshima, Hiroshima 739-8527, Japan
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