Pure Silica Zeolite Films Prepared by a Vapor Phase Transport Method
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概要
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Pure silica zeolite films were prepared by a vapor-phase transport method using ethylenediamine (EDA), triethylamine (Et3N), and water as vapor sources. The optimum mixture ratio of $\text{EDA}:\text{Et$_{3}$N}:\text{H$_{2}$O}$ was $1:2:1$ for forming randomly oriented ZSM-48 zeolite crystals. Compared with samples formed by the sol–gel technique and spin-coating method, the vapor-phase transport method can suppress isolated Si–OH bonds and film shrinkage. Dielectric constant decreased with increasing vapor-phase transport time, and leakage current decreased to an order of $10^{-8}$ A/cm2.
- 2008-11-25
著者
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Kikkawa Takamaro
Research Center For Nanodevices And Systems Hiroshima University
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Cho Yoshinori
Research Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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Seo Toshiki
Research Center for Nanodevices and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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Kohmura Kazuo
Heterogeneous Catalysis Group, Catalyst Science Laboratory, Mitsui Chemicals, Inc., 580-32 Nagaura, Sodegaura, Chiba 299-0265, Japan
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Kikkawa Takamaro
Research Center for Nanodevice and Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima 739-8527, Japan
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Kikkawa Takamaro
Research Center for Nanodevice and Systems (RCNS), Hiroshima University, Higashihiroshima, Hiroshima 739-8527, Japan
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