The structural origin of determining the coefficient of thermal expansion for porous silica low-k films

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概要

• 論文の詳細を見る
• 2006-09-13

著者

• KIKKAWA Takamaro

  MIRAI, Advanced Semiconductor Research Center, AIST

• 吉川 公麿

  広島大学:産業総合研究所

• SHISHIDA Yoshinori

  MIRAI-Association of Super-Advanced Electronics Technology (ASET)

• NAKAYAMA Takahiro

  MIRAI-ASET

• Hata Nobuhiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• Hata Nobuhiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology

• Kikkawa Takamaro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• Kikkawa Takamaro

  Mirai Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Scienc

• Shishida Yoshinori

  Mirai-association Of Super-advanced Electronics Technologies

• YAMAJI Masahiro

  Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and

• HYODO Yasuyoshi

  MIRAI-Association of Super-Advanced Electronics Technologies

• Kikkawa Takamaro

  Millenium Research For Advanced Information Technology (mirai)-asrc Aist

• Hata Nobuhiro

  Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol

• Yamaji Masahiro

  Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And

• Shishida Yoshinori

  MIRAI—Association of Super-Advanced Electronics Technology (ASET), Tsukuba, Ibaraki 305-8569, Japan

• Nakayama Takahiro

  MIRAI, Association of Super-Advanced Electronics Technologies (ASET), Tsukuba, Ibaraki 305-8569, Japan

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