Molecular Orbital Calculation of the Elastic Modulus and the Dielectric Constant for Ultra Low-k Organic Polymers

スポンサーリンク

概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-02-15

著者

• KIKKAWA Takamaro

  MIRAI, Advanced Semiconductor Research Center, AIST

• Kawahara J

  Assoc. Super-advanced Electronics Technol. (aset) Ibaraki Jpn

• Kawahara Jun

  Mirai-association Of Super-advanced Electronics Technology (aset)

• HATA Nobuhiro

  MIRAI-Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scien

• UERA Kazuyoshi

  Advanced Semiconductor Research Center (ASRC)

• MIYOSHI Hidenori

  MIRAI, Association of Super-Advanced Electronics Technologies (ASET)

• Miyoshi Hidenori

  Mirai Association Of Super-advanced Electronics Technologies (aset)

関連論文

• Simple Models on Enhancement of Mechanical Properties of Porous Silica Low-k Films by Tetramethylcyclotetrasiloxane(TMCTS) Vapor Annealing Treatment
• Plasma-enhanced polymerization thin films as a drift barrier for Cu interconnects
• Mechanical Strength of Multilayered Dielectric Structures Measured by Laser-Pulse Generated Surface-Acoustic-Wave Technique
• Molecular Orbital Calculation of the Elastic Modulus and the Dielectric Constant for Ultra Low-k Organic Polymers
• Theoretical Investigation of Dielectric Constant and Elastic Modulus of Two-Dimensional Periodic Porous Silica Films with Elliptical Cylindrical Pores
• Mechanical Property and Network Structure of Porous Silica Films
• Nondestructive Characterization of a Series of Periodic Porous Silica Films by in situ Spectroscopic Ellipsometry in a Vapor Cell
• Control of Pore Structures in Periodic Porous Silica Low-k Films
• Mechanical Property Determination of Thin Porous Low-k Films by Twin-Transducer Laser Generated Surface Acoustic Waves
• Theoretical Analysis of Elastic Modulus and Dielectric Constant for Low-k Two-Dimensional Periodic Porous Silica Films
• Preferential Nucleation of Nanocrystalline Silicon along Microsteps
• Preferential Nucleation of Nanocrystalline Silicon along Microsteps
• Direct Observation of Electromigration and Induced Stress in Cu Nanowire
• Transient Capacitance Spectroscopy of Copper-Ion-Drifted Methylsilsesquiazane-Methylsilsesquioxane Interlayer Dielectrics
• Role of Frictional Force on the Polishing Rate of Cu Chemical Mechanical Polishing
• Theoretical Investigation into Effects of Pore Size and Pore Position Distributions on Dielectric Constant and Elastic Modulus of Two-Dimensional Periodic Porous Silica Films
• The structural origin of determining the coefficient of thermal expansion for porous silica low-k films
• Nondestructive characterization of temperature-dependent backbone Si-O-Si structure in porous silica films by in-situ Fourier-transform infrared spectroscopy
• Infrared Complex Dielectric Function Analysis for Chemical Bonding Structure of Porous Silica Low Dielectric Constant Films
• Adsorption in-situ Spectroscopic Ellipsometry Analysis of Disordered Porous Silica Low-k Films
• Electrical Characteristics of Porous Zeolite Interlayer Dielectrics
• Microstructure Characterization of Skeletal Silica in Porous Low-k Films by Infrared Spectroscopic Ellipsometry
• Plasma-Enhanced Co-Polymerization of Organo-siloxane and Hydrocarbon for Low-$k$/Cu Interconnects
• Molecular Orbital Calculation of the Elastic Modulus and the Dielectric Constant for Ultra Low-$k$ Organic Polymers
• Plasma-Enhanced-Polymerization Thin-Film as a Drift Barrier for Cu Ions
• Theoretical Investigation of Dielectric Constant and Elastic Modulus of Three-Dimensional Isotropic Porous Silica Films with Cubic and Disordered Pore Arrangements
• Theoretical Investigation into Effects of Pore Size and Pore Position Distributions on Dielectric Constant and Elastic Modulus of Two-Dimensional Periodic Porous Silica Films

もっと見る 閉じる

スポンサーリンク