Role of Frictional Force on the Polishing Rate of Cu Chemical Mechanical Polishing
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-04-30
著者
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KIKKAWA Takamaro
MIRAI, Advanced Semiconductor Research Center, AIST
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MATSUO Hisanori
MIRAI, Association of Super-Advanced Electronics Technologies (ASET)
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Matsuo Hisanori
Mirai Association Of Super-advanced Electronics Technologies (aset)
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ISHIKAWA Akira
MIRAI, Association of Super-Advanced Electronics Technologies (ASET)
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