Nondestructive Characterization of a Series of Periodic Porous Silica Films by in situ Spectroscopic Ellipsometry in a Vapor Cell
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-04-15
著者
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HATA Nobuhiro
MIRAI-Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Scien
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Yamada K
Mirai Association Of Super-advanced Electronics Technologies (aset)
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YAMADA Kazuhiro
MIRAI, Association of Super-Advanced Electronics Technologies (ASET)
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NEGORO Chie
ASRC, AIST
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KIKKAWA Takamaro
RCNS, Hiroshima Univ.
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- Mechanical Property and Network Structure of Porous Silica Films
- Nondestructive Characterization of a Series of Periodic Porous Silica Films by in situ Spectroscopic Ellipsometry in a Vapor Cell
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- Mechanical Property Determination of Thin Porous Low-k Films by Twin-Transducer Laser Generated Surface Acoustic Waves
- Theoretical Analysis of Elastic Modulus and Dielectric Constant for Low-k Two-Dimensional Periodic Porous Silica Films
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- Theoretical Investigation into Effects of Pore Size and Pore Position Distributions on Dielectric Constant and Elastic Modulus of Two-Dimensional Periodic Porous Silica Films
- Electrical Characteristics of Porous Zeolite Interlayer Dielectrics
- Microstructure Characterization of Skeletal Silica in Porous Low-k Films by Infrared Spectroscopic Ellipsometry
- Nondestructive Characterization of a Series of Periodic Porous Silica Films by in situ Spectroscopic Ellipsometry in a Vapor Cell
- Control of Pore Structures in Periodic Porous Silica Low-$k$ Films