Yoshino Takenobu | Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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概要
- YOSHINO Takenobuの詳細を見る
- 同名の論文著者
- Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technolの論文著者
関連著者
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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Hata Nobuhiro
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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TAKADA Syozo
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and
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Yoshino Takenobu
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Industrial Science And
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Yoshino Takenobu
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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Takada Syozo
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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Takada Syozo
Asrc Aist
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Takada Syozo
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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Hata Nobuhiro
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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Hata Nobuhiro
Asrc Aist
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Hata Nobuhiro
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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SEINO Yutaka
Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Techno
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Takimura Toshinori
Advanced Semiconductor Research Center (asrc) National Institute Of Advanced Science And Technology
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Seino Yutaka
Advanced Semiconductor Research Center National Institute Of Advanced Industrial Science And Technol
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Seino Yutaka
Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8569, Japan
著作論文
- Influences of Skeletal Structure and Porosity on Dielectric and Mechanical Properties of Porous Organosilica Low-k Films
- Determination of mechanical properties of porous silica low-k films on Si substrates using orientation dependence of surface acoustic wave