Formation of Si₂N₂O Microcrystalline Precipitates near the Quartz Crucible Wall Coated with Silicon Nitride in Cast-Grown Silicon
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概要
著者
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Ono Haruhiko
Kanagawa Industrial Technol. Center Kanagawa Jpn
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TACHIBANA Tomihisa
Meiji University
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Kusunoki Hiroki
Kanagawa Industrial Technology Center
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Ogura Atsushi
Meiji Univ. Kawasaki Jpn
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Motoizumi Yu
Kanagawa Industrial Technology Center, 705-1 Shimoimaizumi, Ebina, Kanagawa 243-0435, Japan
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Motoizumi Yu
Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan
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Sato Kuniyuki
Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan
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- Formation of Si
- Formation of Si₂N₂O Microcrystalline Precipitates near the Quartz Crucible Wall Coated with Silicon Nitride in Cast-Grown Silicon
- Ni Thin Film Deposition from Tetrakistrifluorophosphine-Nickel
- Ion Shower Doping Technique for Selective Emitter Structure in Crystalline Silicon Solar Cells (Special Issue : Solid State Devices and Materials)