Formation of Si
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概要
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The chemical reaction near the crucible wall during directional solidification of Si crystals for solar cells has been investigated. Fragments of the crucible that were used for the crystal growth of a Si ingot were examined. As results, we found that a chemical reaction took place at the coating/crucible interface and that silicon oxynitride particles precipitated near the crucible wall. The oxynitride precipitates were determined as stoichiometric Si<inf>2</inf>N<inf>2</inf>O and were revealed not to be amorphous but of orthorhombic crystal symmetry. We show crucial evidence of the formation of stoichiometric Si<inf>2</inf>N<inf>2</inf>O microcrystalline precipitates inside the Si crystal.
- 2013-08-25
著者
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Ono Haruhiko
Kanagawa Industrial Technol. Center Kanagawa Jpn
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TACHIBANA Tomihisa
Meiji University
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Kusunoki Hiroki
Kanagawa Industrial Technology Center
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Ogura Atsushi
Meiji Univ. Kawasaki Jpn
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Motoizumi Yu
Kanagawa Industrial Technology Center, 705-1 Shimoimaizumi, Ebina, Kanagawa 243-0435, Japan
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Motoizumi Yu
Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan
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Sato Kuniyuki
Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan
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- Formation of Si
- Formation of Si₂N₂O Microcrystalline Precipitates near the Quartz Crucible Wall Coated with Silicon Nitride in Cast-Grown Silicon
- Ni Thin Film Deposition from Tetrakistrifluorophosphine-Nickel
- Ion Shower Doping Technique for Selective Emitter Structure in Crystalline Silicon Solar Cells (Special Issue : Solid State Devices and Materials)