Effects of NH_3 Plasma Treatment on Methyl Silsequioxane for Copper Multi-Level Interconnect(Semiconductors)
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2002-06-15
著者
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Kim Y
Electronics And Telecommunications Res. Inst. (etri) Daejeon Kor
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Sim H
Korea Inst. Of Sci. And Technol. Seoul Kor
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Kim Yong
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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JEON Hyeongtag
Division of Materials Science and Engineering, Hanyang University
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SIM Hyun
Semiconductor Materials and Devices Lab., Korea Institute of Science and Technology
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Sim Hyun
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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Jeon Hyeongtag
Division Of Materials Science And Engineering Hanyang University
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KlM Yong
Semiconductor Materials Laboratory, Korea Institute of Science and Technology
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Jeon Hyeongtag
Division Of Materials Science & Engineering Hanyang University
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Klm Yong
Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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