Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)_2] and Dicobalt Octacarbonyl [Co_2(CO)_8]
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概要
- 論文の詳細を見る
- 2007-03-25
著者
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Jeon Hyeongtag
Division Of Materials Science & Engineering Hanyang University
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Lee Youngjin
R&d Division Hynix Semiconductor Inc.
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Kim Keunjun
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Keunwoo
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Han Sejin
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Park Taeyong
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Youngjin
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Kim Jeongtae
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Yeom Seungjin
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Kim Keunjun
Division Of Materials Science And Engineering Hanyang University
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Park Taeyong
Division Of Materials Science And Engineering Hanyang University
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Yeom Seungjin
R&d Division Hynix Semiconductor Inc.
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Lee Keunwoo
Division Of Materials Science And Engineering Hanyang University
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Han Sejin
Division Of Materials Science And Engineering Hanyang University
関連論文
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- Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)_2] and Dicobalt Octacarbonyl [Co_2(CO)_8]
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