Lee Keunwoo | Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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概要
- Lee Keunwooの詳細を見る
- 同名の論文著者
- Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Koreaの論文著者
関連著者
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Jeon Hyeongtag
Division Of Materials Science & Engineering Hanyang University
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Lee Keunwoo
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Keunwoo
Division Of Materials Science And Engineering Hanyang University
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Kim Yangdo
School Of Materials Science And Engineering Pusan National University
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Lee Youngjin
R&d Division Hynix Semiconductor Inc.
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Kim Keunjun
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Han Sejin
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Park Taeyong
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Youngjin
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Kim Jeongtae
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Yeom Seungjin
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Kim Keunjun
Division Of Materials Science And Engineering Hanyang University
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Park Taeyong
Division Of Materials Science And Engineering Hanyang University
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Yeom Seungjin
R&d Division Hynix Semiconductor Inc.
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Han Sejin
Division Of Materials Science And Engineering Hanyang University
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Cho Seungchan
School of Materials Science and Engineering, Pusan National University, Busan 609-735, Korea
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Song Pungkeun
School of Materials Science and Engineering, Pusan National University, Busan 609-735, Korea
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Kim Yangdo
School of Materials Science and Engineering, Pusan National University, Busan 609-735, Korea
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Jeon Hyeongtag
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
著作論文
- Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)_2] and Dicobalt Octacarbonyl [Co_2(CO)_8]
- Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(diethylamino)zirconium Precursor