Park Taeyong | Division Of Materials Science And Engineering Hanyang University
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概要
関連著者
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Jeon Hyeongtag
Division Of Materials Science & Engineering Hanyang University
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Park Taeyong
Division Of Materials Science And Engineering Hanyang University
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Park Taeyong
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Jeongtae
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Yeom Seungjin
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Lee Keunwoo
Division Of Materials Science And Engineering Hanyang University
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Jeon Heeyoung
Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Jaesang
Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791, Korea
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Park Jingyu
Department of Nano-scale Semiconductor Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Jinwoo
Division Of Applied Chemical Engineering Pukyong National University
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Lee Youngjin
R&d Division Hynix Semiconductor Inc.
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Kim Keunjun
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Keunwoo
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Han Sejin
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Lee Youngjin
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon-si, Kyoungi-do 467-701,
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Kim Keunjun
Division Of Materials Science And Engineering Hanyang University
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Yeom Seungjin
R&d Division Hynix Semiconductor Inc.
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Han Sejin
Division Of Materials Science And Engineering Hanyang University
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Lee Jaesang
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Kwak Nohjung
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon, Gyeonggi-do 467-701, Korea
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Kim Jeongtae
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon, Gyeonggi-do 467-701, Korea
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Kim Jinwoo
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Yeom Seungjin
R&D Division, Hynix Semiconductor Inc., San 136-1, Ami-ri, Bubal-eup, Icheon, Gyeonggi-do 467-701, Korea
著作論文
- Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)_2] and Dicobalt Octacarbonyl [Co_2(CO)_8]
- Characteristics of Cobalt Films Deposited by Metal Organic Chemical Vapor Deposition Method Using Dicobalt Hexacarbonyl tert-Butylacetylene
- Reduction of RuO
- Reduction of RuO₂ Film to Metallic Ru Film Using Atomic Layer Deposition under Different Oxygen Partial Pressure (Special Issue : Advanced Metallization for ULSI Applications)