Characteristics of Polymer Residues Formed at the Via Hole and Photoresist Ashing Properties of Remote Oxygen/Nitrogen Plasma
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概要
- 論文の詳細を見る
The low-temperature remote oxygen/nitrogen plasma ashing process that removes both the photoresist and polymer residues containing carbon and fluorine after reactive ion etching (RIE) process was investigated. The fluorocarbon residue was distributed with a depth of several tens of angstroms from the surface with a relatively homogeneous spatial distribution after the RIE process. X-ray photoelectron spectroscopy (XPS) analysis also showed the formation of fluorocarbon films during RIE with mainly C–C, C–CFx ($x=1,2,3$), CF, and CF2 bonds. The ashing rate increased with increasing amount of nitrogen addition to oxygen gas and showed saturation at approximately 10% of nitrogen addition. Mass spectrometry measurement revealed that the amount of atomic oxygen increased with the addition of nitrogen to oxygen gas. This study revealed that atomic oxygen is the primary reactive species responsible for removal of photoresist in the remote oxygen/nitrogen ashing process.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-03-15
著者
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Kim Young
Department Of Agricultural Chemistry The University Of Tokyo
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SEO Hyungtak
Division of Materials Science and Engineering, Hanyang University
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Kim Yangdo
School Of Materials Science And Engineering Pusan National University
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Jeon Hyeongtag
Division Of Materials Science & Engineering Hanyang University
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KIM Sung
Division of Enteric Bacterial Infection, Center for Infectious Disease, National Institute of Health
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Kim Young
Department of Chemical Engineering, Hanyang University, Seoul 133-791, Korea
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Song Jongkook
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Seo Hyungtak
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Soh Hyun
Department of Chemical Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Sung
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Yangdo
School of Materials Science and Engineering, Pusan National University, Pusan 609-735, Korea
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