Surface Characteristics of Indium-Tin Oxide Cleaned by Remote Plasma
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概要
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We investigated the remote oxygen and hydrogen plasma cleaning of indium-tin oxide and its surface electronic properties. Samples cleaned by hydrogen plasma after oxygen plasma cleaning showed the complete absence of surface contaminants while samples cleaned by only hydrogen or oxygen plasma showed some residual contaminants. Work function is mainly affected by oxygen plasma treatments while sheet resistance is more closely related to the removal of surface carbon contaminants. This study revealed that surface dipoles due to the O- ions are believed to have a more significant contribution to the change in work function than the reduction of Sn4+.
- 2005-02-15
著者
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Kim Yangdo
School Of Materials Science And Engineering Pusan National University
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Seo Hyungtak
Department Of Electrical And Computer Engineering North Carolina State University
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Jeon Hyeongtag
Division Of Materials Science & Engineering Hanyang University
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Seo Hyungtak
Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695-7911, USA
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Kim Seokhoon
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Kim Kibeom
OLED Division, LG Electronics Institute of Technology, LG Electronics, Kumi 730-030, Korea
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Tak Yoonheung
OLED Division, LG Electronics Institute of Technology, LG Electronics, Kumi 730-030, Korea
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