Moisture Barrier Properties of Al₂O₃ Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Seo Hyungtak
Department Of Electrical And Computer Engineering North Carolina State University
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Jeon Hyeongtag
Division Of Materials Science & Engineering Hanyang University
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Lee Sanghun
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Choi Hagyoung
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Jung Hyunsoo
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Shin Seokyoon
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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Ham Giyul
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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