ZrO_2 Gate Dielectric Deposited by Plasma-Enhanced Atomic Layer Deposition Method
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概要
- 論文の詳細を見る
- 2002-05-15
著者
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KIM Yangdo
Division of Materials Science and Engineering, Hanyang University
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JEON Hyeongtag
Division of Materials Science and Engineering, Hanyang University
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Kim Yangdo
Division Of Materials Science And Engineering. Hanyang University
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Koo Jaehyoung
Division Of Materials Science And Engineering. Hanyang University
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Jeon Hyeongtag
Division Of Materials Science And Engineering. Hanyang University
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Jeon Hyeongtag
Division Of Materials Science & Engineering Hanyang University
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Koo Jaehyoung
Division of Materials Science and Engineering, Hanyang University, Seoul 133-791, Korea
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