Removal of the Polymer Formed at Via Hole with Via Etching Stopped on an Al layer Structure
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-03-15
著者
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Kim Jong-soo
T-pjt Memory Division Device Solution Network Samsung Electronics Co. Ltd.
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JEON Hyeongtag
Division of Materials Science and Engineering, Hanyang University
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SONG Jonekook
Division of Materials Science and Engineering, Hanyang University
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SEO Hyungtak
Division of Materials Science and Engineering, Hanyang University
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KIM Yangdo
School of Materials Science and Engineering, Pusan National University
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