Performance of the Plasma-Deposited Tungsten Nitride Diffusion Barrier for Al and Au Metallization
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-12-30
著者
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Kim Yong
Semiconductor Materials and Devices Lab, Korea Institute of Science and Technology
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Min S‐k
Korea Univ. Chungnam Kor
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Min Suk-ki
Semiconductor Mat. Lav.
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Kim Yong
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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Kim Yong
Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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Lee Chang
Semiconductor Materials Laboratory Korea Institute Of Science And Technology:(present Address)depart
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