Enhancement of Selective Chemical Vapor Deposition of Copper by Nitrogen Plasma Pretreatment

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-04-15

著者

• Kim Young

  Semiconductor Materials and Devices Lab, Korea Institute of Science and Technology

• KIM Eun

  Semiconductor Materials Research Center Korea Institute of Science and Technology

• Min S‐k

  Korea Univ. Chungnam Kor

• Min Suk-ki

  Semiconductor Mat. Lav.

• Jung D

  Sungkyunkwan Univ. Suwon Kor

• Jung Donggeun

  Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center

• Jung Donggeun

  Department Of Physics And Institute Of Basic Science Sungkyunkwan University

• Kim D

  Semiconductor Materials Laboratory Korea Institute Of Science And Technology

• Kim Dong

  Semiconductor Materials Research Center Korea Institute Of Science And Technology

• Kim Young

  Semiconductor Materials Research Center Korea Institute Of Science And Technology:department Of Phys

• Kim Young

  Semiconductor Materials And Devices Lab Korea Institute Of Science And Technology

• Kim Eun

  Semiconductor Materials Laboratory Korea Institute Of Science And Technology

• KWAK Sung

  Semiconductor Materials Research Center, Korea Institute of Science and Technology

• Jung Donggeun

  Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sun Gl

• Kwak Sung

  Semiconductor Materials Research Center Korea Institute Of Science And Technology

• Kim Dong

  Semiconductor Materials Laboratory Korea Institute Of Science And Technology

• Kim Dong

  Semiconductor Lab, Samsung Advanced Institute of Technology, Samsung Electronics, Gyeonggi-do 446-712, Korea

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