Structural and Electrical Properties of HfO2/ Hf-silicate /Si Structures by rf-Magnetron Sputtering (2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices(AWAD 2001))
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概要
- 論文の詳細を見る
- 電子情報通信学会の論文
- 2001-07-05
著者
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Jung D
Sungkyunkwan Univ. Suwon Kor
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Jung Donggeun
Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sun Gl
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Bae Geunhag
Department Of Physics Brain Dorea 21 Physics Research Division And Institute Of Basic Science
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Lee Hunjung
Department Of Physics Brain Dorea 21 Physics Research Division And Institute Of Basic Science
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- Structural and electrical properties of HfO_2/Hf-silicate/Si structures by rf magnetron sputtering
- Structural and electrical properties of HfO_2/Hf-silicate/Si structures by rf magnetron sputtering
- Structural and Electrical Properties of HfO2/ Hf-silicate /Si Structures by rf-Magnetron Sputtering (2001 Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices(AWAD 2001))
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