Properties of Low-k (k-2.05) Plasma Polymer Films Deposited by PECVD Using Decamethyl-cyclopentasiloxane and Cyclohexane as the Precursors
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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Jung Donggeun
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Jung Donggeun
Department Of Physics And Institute Of Basic Science Sungkyunkwan University
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YANG Jaeyoung
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science,and Cent
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Yang Jaeyoung
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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LEE Sungwoo
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, and Cen
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CHAE Heeyeop
Department of Chemical Engineering, Sungkyunkwan University
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KIM Kyounghwan
Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sung
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Kim Kyounghwan
Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sungky
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Jung Donggeun
Sungkyunkwan Univ. Suwon Kor
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Lee Sungwoo
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Chae Heeyeop
Department Of Chemical Engineering Sungkyunkwan University
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