Effect of Annealing Temperature on Dielectric Constant and Bonding Structure of Low-k SiCOH Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-02-15
著者
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Jung Donggeun
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Jung Donggeun
Department Of Physics And Institute Of Basic Science Sungkyunkwan University
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YANG Jaeyoung
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science,and Cent
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Yang Jaeyoung
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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LEE Sungwoo
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, and Cen
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YEO Sanghak
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, and Cen
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LEE Jaewon
Department of Chemical Engineering, Sungkyunkwan University
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BOO Jin-hyo
Department of Chemistry, Sungkyunkwan University
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KIM Hyoungsub
Department of Materials Engineering, Sungkyunkwan University
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CHAE Heeyeop
Department of Chemical Engineering, Sungkyunkwan University
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Boo Jin-hyo
Department Of Chemistry Sungkyunkwan University
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Lee Jaewon
Department Of Chemical Engineering Sungkyunkwan University
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Yeo Sanghak
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Kim Hyoungsub
Department Of Advanced Materials Engineering Sungkyunkwan University
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Kim Hyoungsub
Department Of Materials Engineering Sungkyunkwan University
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Boo Jin-hyo
Department Of Chemistry Bk21 School Of Chemical Materials Science Sungkyunkwan University
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Jung Donggeun
Sungkyunkwan Univ. Suwon Kor
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Lee Sungwoo
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Chae Heeyeop
Department Of Chemical Engineering Sungkyunkwan University
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Boo Jin-Hyo
Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea
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