Characteristics of Copper Diffusion into Low Dielectric Constant Plasma Polymerized Cyclohexane Thin Films
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-12-15
著者
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Jung Donggeun
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Jung Donggeun
Department Of Physics And Institute Of Basic Science Sungkyunkwan University
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Jung Donggeun
Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sungky
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YANG Cheol-Woong
School of Adv. Material Sci. & Eng., Sungkyunkwan University
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SHIM Cheonman
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, and Cen
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Shim Cheonman
Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sungky
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CHOI Jayoung
Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sung
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LEE Nae-Eung
School of Metallurgical and Materials Engineering, Sungkyunkwan University
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Lee Nae-eung
School Of Metallurgical And Materials Engineering Sungkyunkwan University
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Choi Jayoung
Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sungky
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Lee Nae-Eung
School of Advanced Materials Science and Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University, Suwon, Kyunggi-do 440-746, Korea
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