Diffusion Barrier Characteristics of Hf(C, N) Thin Films Deposited by Plasma Enhanced Metal Organic Chemical Vapor Deposition for Cu Metallization
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-04-01
著者
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Jung Donggeun
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Jung Donggeun
Department Of Physics And Institute Of Basic Science Sungkyunkwan University
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ROH Woo-Cheol
Department of Physics, Sung Kyun Kwan University
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Roh Woo-cheol
Department Of Physics Sung Kyun Kwan University
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