Yang Jaeyoung | Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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概要
- YANG Jaeyoungの詳細を見る
- 同名の論文著者
- Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Centerの論文著者
関連著者
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Jung Donggeun
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Jung Donggeun
Department Of Physics And Institute Of Basic Science Sungkyunkwan University
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YANG Jaeyoung
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science,and Cent
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Yang Jaeyoung
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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CHAE Heeyeop
Department of Chemical Engineering, Sungkyunkwan University
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Jung Donggeun
Sungkyunkwan Univ. Suwon Kor
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Chae Heeyeop
Department Of Chemical Engineering Sungkyunkwan University
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LEE Sungwoo
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, and Cen
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Lee Sungwoo
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Yang Jinfeng
Sumitomo Heavy Industries Ltd.
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Yang J
Department Of Ee University Of South Carolina
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Jung D
Sungkyunkwan Univ. Suwon Kor
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SHIM Cheonman
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, and Cen
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Shim Cheonman
Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sungky
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YEO Sanghak
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, and Cen
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BOO Jin-hyo
Department of Chemistry, Sungkyunkwan University
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Boo Jin-hyo
Department Of Chemistry Sungkyunkwan University
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Yang J
Ipec
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Yeo Sanghak
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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Shim C
Sungkyunkwan Univ. Suwon Kor
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CHOI Munkyu
Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science,and Cent
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Choi Munkyu
Department Of Physics Brain Korea 21 Physics Research Division Institute Of Basic Science And Center
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SOHN Sunyoung
Department of Physics, Institute of Basic Science, and Brain Korea 21 Physics Research Division, Sun
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LEE Jaewon
Department of Chemical Engineering, Sungkyunkwan University
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KIM Hyoungsub
Department of Materials Engineering, Sungkyunkwan University
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BOO Jinhyo
Department of Chemistry, Institute of Basic Science, and Brain Korea 21 Chemistry Research Division,
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KIM Kyounghwan
Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sung
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Jung Donggeun
Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sun Gl
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Lee Jaewon
Department Of Chemical Engineering Sungkyunkwan University
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Sohn Sunyoung
Department Of Physics Institute Of Basic Science And Brain Korea 21 Physics Research Division Sungky
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Kim Hyoungsub
Department Of Advanced Materials Engineering Sungkyunkwan University
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Kim Hyoungsub
Department Of Materials Engineering Sungkyunkwan University
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Kim Kyounghwan
Department Of Physics Brain Korea 21 Physics Research Division And Institute Of Basic Science Sungky
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Boo Jin-hyo
Department Of Chemistry Bk21 School Of Chemical Materials Science Sungkyunkwan University
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Boo Jin-Hyo
Department of Chemistry and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746, Korea
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Sohn Sunyoung
Department of Electronics Engineering, Catholic University of Daegu, Gyeongsan, Gyeongbuk 712-702, Republic of Korea
著作論文
- Characteristics under Bias-Temperature-Stress of Cu/Low-k a-SiCO: H Structures Prepared by Plasma Enhanced Chemical Vapor Deposition Using a Hexamethyldisilane Precursor and Cu Sputtering
- Effects of Post-Deposition Heat Treatment on the Properties of Low Dielectric Constant Plasma Polymerized Decahydronaphthalene Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition
- Effect of Annealing Temperature on Dielectric Constant and Bonding Structure of Low-k SiCOH Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition
- Characteristics of polymer light emitting diodes with the LiF anode interfacial layer
- Properties of Low-k (k-2.05) Plasma Polymer Films Deposited by PECVD Using Decamethyl-cyclopentasiloxane and Cyclohexane as the Precursors
- Properties of Low-k (k-2.05) Plasma Polymer Films Deposited by PECVD Using Decamethyl-cyclopentasiloxane and Cyclohexane as the Precursors