Highly Conductive Tungsten Thin Films Prepared by the Plasma-Assisted Silane Reduction Process
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1991-04-15
著者
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Kim Yong
Semiconductor Materials and Devices Lab, Korea Institute of Science and Technology
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Min Suk-ki
Semiconductor Mat. Lav.
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Kim Choong-ki
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Kim Yong
Semiconductor Devices Laboratory Korea Institute Of Science And Technology
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Min Suk-ki
Semiconductor Materials Laboratory Korea Institute Of Science And Technology
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Hong Jong
Department Of Internal Medicine Sungkyunkwan University School Of Medicine
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Hong Jong
Department Of Physics Dongguk University
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Kim Choong-ki
Department Of Electrical Engineering And Center For Electro-optics Korea Advanced Institute Of Scien
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