Suppression of Leakage Current in n-Channel Polysilicon Thin-Film Transistors Using NH_3 Annealing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-02-28
著者
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Kim Choong-ki
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Kim C‐k
Korea Advanced Inst. Sci. And Technol. Daejon Kor
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HAN Chul-Hi
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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CHOI Deuk-Sung
semiconductor R/D Lab. of Hyundai Electronics Industries Co. Ltd.
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Choi Deuk-Sung
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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Hur Sung-Hoi
D Laboratory of Hyndai Electronics Industries Co., Ltd.
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Yang Gi-Young
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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Han C‐h
Department Of Materials Engineering Hanyang University
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Choi Deuk-sung
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology:semiconducto
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HUR Sung-Hoi
Department of Electrical Eingineering, Korea Advenced Institute of Science and Technology
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Han C‐h
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Hur Sung-hoi
Department Of Electrical Eingineering Korea Advenced Institute Of Science And Technology
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Yang Gi-young
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Han Chul-hi
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Kim Choong-ki
Department Of Electrical Engineering And Center For Electro-optics Korea Advanced Institute Of Scien
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