Han C‐h | Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology

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概要

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著作論文

Application of Electron Cyclotron Resonance Plasma Thermal Oxidation to Bottom Gate Polysilicon Thin-Film Transistors
Hydrogenation of Polysilicon Thin Film Transistors Using Inductively Coupled Plasma
Application of Electron Cyclotron Resonance Plasma Thermal Oxidation to Bottom Gate Polysilicon Thin Film Transistors
Suppression of Leakage Current in n-Channel Polysilicon Thin-Film Transistors Using NH_3 Annealing
Remote Plasma-Assisted Metal Organic Chemical Vapor Deposition of Tantalum Nitride Thin Films with Different Radicals
Barrier Metal Properties of Amorphous Tantalum Nitride Thin Films between Platinum and Silicon deposited using Remote Plasma Metal Organic Chemical Vapor Method
Endurance Characteristics and Degradation Mechanism of Polysilicon Thin Film Transistor EEPROMs with Electron Cyclotron Resonance N_2O-Plasma Gate Oxide
High-Performance EEPROMs Using N- and P-Channel Poly-Si TFTs with ECR N2O-Plasma Oxide
Effect of Bottom Polysilicon Doping on the Reliability of Interpoly Oxide Grown Using Electron Cyclotron Resonence N_2O-Plasma
Short Channel Effects in N- and P-Channel Polycrystalline Silicon Thin Film Transistors with Very Thin Electron Cyclotron Resonance N_2O-Plasma Gate Dielectric
Short-Channel Effects in N- and P-Channel Polysilicon Thin Film Transistors with Very Thin ECR N_2O-Plasma Gate Dielectrics
Highly Reliable Interpoly Oxide Using ECR N_2O-Plasma for Next Generation Flash Memory

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