Han Chul-hi | Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology

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著作論文

Low-Temperature Plasma Etching of Copper Films Using Ultraviolet Irradiation
Suppression of Leakage Current in n-Channel Polysilicon Thin-Film Transistors Using NH_3 Annealing
Endurance Characteristics and Degradation Mechanism of Polysilicon Thin Film Transistor EEPROMs with Electron Cyclotron Resonance N_2O-Plasma Gate Oxide
High-Performance EEPROMs Using N- and P-Channel Poly-Si TFTs with ECR N2O-Plasma Oxide
Effect of Bottom Polysilicon Doping on the Reliability of Interpoly Oxide Grown Using Electron Cyclotron Resonence N_2O-Plasma
Short Channel Effects in N- and P-Channel Polycrystalline Silicon Thin Film Transistors with Very Thin Electron Cyclotron Resonance N_2O-Plasma Gate Dielectric
Highly Reliable Interpoly Oxide Using ECR N_2O-Plasma for Next Generation Flash Memory
Reaction Characteristics between Cu Thin Film and RF Inductively Coupled Cl_2 Plasma without/with UV Irradiation
Monolithic Fabrication of Electroplated Solenoid Inductors Using Three-Dimensional Photolithography of a Thick Photoresist
Substrate Resistance Effect on Charge-Pumping Current in Polycrystalline Silicon Thin Film Transistors
Simultaneous and Accurate Formation of Variously Shaped Holes in Silicon Substrate
New Fabrication Process of Single-Crystalline Silicon Islands Using Double Diffusion : Application to a Heating Resistor of a Thermal Inkjet Printhead
Application of Electron Cyclotron Resonance Plasma Thermal Oxidation to Bottom Gate Polysilicon Thin-Film Transistors
Substrate Resistance Effect on Charge-Pumping Current in Polycrystalline Silicon Thin Film Transistors

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