Low-Temperature Plasma Etching of Copper Films Using Ultraviolet Irradiation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-11-15
著者
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Choi K‐s
Korea Advanced Inst. Sci. And Technol.
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CHOI Kang-Sik
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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HAN Chul-Hi
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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Choi Kang-sik
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology:lg Semicon C
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Han Chul-hi
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
関連論文
- Low-Temperature Plasma Etching of Copper Films Using Ultraviolet Irradiation
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