Short Channel Effects in N- and P-Channel Polycrystalline Silicon Thin Film Transistors with Very Thin Electron Cyclotron Resonance N_2O-Plasma Gate Dielectric
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-03-30
著者
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HAN Chul-Hi
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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Han C‐h
Department Of Materials Engineering Hanyang University
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Lee J‐w
Hanyang Univ. Seoul Kor
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Lee J‐w
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee J‐w
Technology Development Semiconductor R&d Center Samsung Electronics Co.
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Lee Jin-woo
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Lee Nae-in
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology:semiconducto
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Han C‐h
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Han Chul-hi
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Lee Jin-woo
Department Of Dermatology Kosin University College Of Medicine
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Lee Jin-woo
Department Of Biomedical Engineering College Of Medicine Kyunghee University
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