Application of Electron Cyclotron Resonance Plasma Thermal Oxidation to Bottom Gate Polysilicon Thin Film Transistors
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Kim Choong-ki
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Kim C‐k
Korea Advanced Inst. Sci. And Technol. Daejon Kor
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KIM Choong-Ki
Center for Electro-Optics Department of Electrical Engineering, Korea Advanced Institute of Science
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HAN Chul-Hi
Center for Electro-Optics Department of Electrical Engineering, Korea Advanced Institute of Science
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HAN Jung-In
Center for Electro-Optics Department of Electrical Engineering, Korea Advanced Institute of Science
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LEE Jung-Yeal
semiconductor R/D Lab. of Hyundai Electronics Industries Co. Ltd.
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CHOI Deuk-Sung
semiconductor R/D Lab. of Hyundai Electronics Industries Co. Ltd.
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Han J‐i
Korea Electronics Technol. Inst. Kyunggi Kor
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Han C‐h
Department Of Materials Engineering Hanyang University
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Choi Deuk-sung
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology:semiconducto
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Han C‐h
Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology
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Han Jung-in
Center For Electro-optics Department Of Electrical Engineering Korea Advanced Institute Of Science A
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