Barrier Metal Properties of Amorphous Tantalum Nitride Thin Films between Platinum and Silicon deposited using Remote Plasma Metal Organic Chemical Vapor Method

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1998-05-01

著者

• Lee Moon

  Samsung Electronics Co. Semiconductor R&d Center Memory Process Development Team

• Lee M

  Samsung Electronics Co. Ltd. Kyungki‐do Kor

• Cho Kwang-nam

  Research Center For Electronic Materials And Components Department Of Electronic Engineering Hanyang

• Oh J‐e

  Hanyang Univ. Ansan Kor

• Han C‐h

  Department Of Materials Engineering Hanyang University

• Lee S‐i

  Process Development Team Semiconductor R&d Center Samsung Electronics

• Park C‐s

  Kwangju Inst. Sci. And Technol. (kjist) Gwangju Kor

• Park Chang-soo

  Memory Business Division Samsung Electronics Inc.

• Lee Sang-in

  Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd.

• Lee S

  Ajou Univ. Suwon Kor

• Lee Sang-in

  Semiconductor R&d Center Samsung Electronics Co. Ltd.

• Lee Sang-in

  Memory Business Division Samsung Electronics Inc.

• Lee Jong

  Memory Business Division Samsung Electronics Inc.

• HAN Chang-Hee

  Department of Materials Engineering, Hanyang University

• OH Jae-Eung

  Research Center for Electronic Materials and Components, Department of Electronic Engineering, Hanya

• PAEK Su-Hyoun

  Department of Materials Engineering, Hanyang University

• LEE Moon

  Memory Business Division, Samsung Electronics, Inc.

• Oh Jae-eung

  Division Of Mechanical Engineering Hanyang University

• OH Jae-Eung

  Han Yang University

• Paek S‐h

  Hanyang Univ. Seoul Kor

• Park C‐s

  Electronics And Telecommunications Res. Inst. Taejeon Kor

• Han Chang-hee

  Department Of Materials Engineering Hanbat National University

• Lee Soo

  Process Development Team Semiconductor R&d Center Samsung Electronics

• Oh Jae-eung

  Research Center For Electronic Materials And Components Department Of Electronic Engineering Hanyang

• Han C‐h

  Department Of Electrical Engineering Korea Advanced Institute Of Science And Technology

• Han Chang-Hee

  Department of Electrical Engineering, Korea Advanced Institute of Science and Technology

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