Investigation of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using SiH_2Cl_2 and O_3 as the Precursors
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概要
- 論文の詳細を見る
- 2004-03-01
著者
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Lee W‐j
Sejong Univ. Seoul Kor
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HAN Chang-Hee
Department of Materials Engineering, Hanyang University
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Han Chang-hee
Department Of Materials Engineering Hanbat National University
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RHA Sa-Kyun
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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PARK Chong-Ook
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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LEE Won-Jun
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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Lee W‐j
Department Of Advanced Materials Engineering Sejong University
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Kim Un-jung
Department Of Advanced Materials Engineering Sejong University
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Park Chong-ook
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Rha S‐k
Department Of Materials Engineering Hanbat National University
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Rha Sa-kyun
Department Of Materials Engineering Hanbat National University
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Lee Won-jun
Department Of Advanced Materials Engineering Sejong University
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Park Chong-ook
Department Of Materials Science And Engineering Kaist
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LEE Joo-Hyeon
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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Lee Joo-hyeon
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Han Chang-Hee
Department of Electrical Engineering, Korea Advanced Institute of Science and Technology
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