Effect of Activation of Oxygen by Electron Cyclotron Resonance Plasma on the Incorporation of Pb in the Deposition of Pb(Zr,Ti)O_3 Films by DC Magnetron Reactive Sputtering

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-09-15

著者

• Lee M‐y

  Samsung Electronics Co. Ltd. Kyungki‐do Kor

• Lee M‐y

  Semiconductor R & D Center Samsung Electronics Co. Ltd.

• Lee Myoung-bum

  Ls Process Development Group Semiconductor R&d Center Samsung Electronics Co. Ltd.

• Kim S‐t

  Samsung Electronics Co. Ltd. Gyeonggi‐do Kor

• Kim Sung-tae

  Semiconductor R & D Center Samsung Electronics Co. Ltd.:department Of Materials Science And Engi

• Lee W‐j

  Sejong Univ. Seoul Kor

• Lee Moon-yong

  Semiconductor R & D Center Samsung Electronics Co.ltd.

• Kim H‐h

  Samsung Electronics Co. Ltd. Kyungki‐do Kor

• KIM Yong-Il

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• KIM Hyun-Ho

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• LEE Won-Jong

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• Lee Moon-yong

  Semiconductor R & D Center Samsung Electronics Co. Ltd.

• Lee W‐j

  Department Of Advanced Materials Engineering Sejong University

• Kim Y‐i

  Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology

• Kim Hyun-ho

  Department Of Materials Science And Engineering Kaist

• Lee Won-jong

  Department Of Computer Science Yonsei University

• Kim Yong-il

  Department Of General Medicine & Clinical Epidemiology Kyoto University Hospital Kyoto Universit

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