Microstructure and Electrical Properties of Tantalum Oxide Thin Film Prepared by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-12-15
著者
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Lee Jeong
Department of Obstetrics and Gynaecology, College od Medicine, Soonchunhyang University
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LEE Won-Jong
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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Ahn S‐t
Micro-electronics Tech. Lab. Electronics And Telecommunications Research Institute
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Lee Won-jong
Department Of Computer Science Yonsei University
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Lee Won-jong
Department Of Electronic Materials Engineering Korea Advanced Institute Of Science And Technology
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Lee Jeong
Department Of Clothing And Textiles Gyeongsang National University
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KIM II
Department of Electronic Materials Engineering, Korea Advanced Institute of Science and Technology
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AHN Sung-Duck
Department of Electronic Materials Engineering, Korea Advanced Institute of Science and Technology
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CHO Bok-Won
Department of Electronic Materials Engineering, Korea Advanced Institute of Science and Technology
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AHN Sung-Tae
Samsung Electronics Co., Ltd.,
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CHUN John
Department of Electronic Materials Engineering, Korea Advanced Institute of Science and Technology
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Kim Ii
Department Of Electronic Materials Engineering Korea Advanced Institute Of Science And Technology
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Chun John
Department Of Electronic Materials Engineering Korea Advanced Institute Of Science And Technology
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Cho Bok-won
Department Of Electronic Materials Engineering Korea Advanced Institute Of Science And Technology
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Lee Jeong
Department Of Anesthesiology And Pain Medicine Yonsei University College Of Medicine
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LEE Jeong
Department of Electronic Materials Engineering, Korea Advanced Institute of Science and Technology
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