Surface Morphologies of BaTiO_3 Thin Films by Atomic Force Mieroscopy
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概要
- 論文の詳細を見る
Surface morphologies of BaTiO_3 thin films have been studied by atomic force microscopy (AFM). The films on (111)InSb, indium tin oxide (ITO)-coated glass and (100)Si substrates are deposited by in-situ metalorganic chemical vapor deposition (MOCVD) at different deposition temperatures of 300℃, 400℃ and 600℃, respectively. AFM under ambient conditions showed that the BaTiO_3 film deposited on the ITO-coated glass had a smooth surface consisting of large hemispherical grains, while the film on (100)Si had a slightly rough surface with <110>textured rectangular grains. As-grown film on the (111)InSb substrate was in the amorphous phase except near the interface, resulting in a rough surface. Our results of dependence on the kind of substrates and growth temperature suggest that the surface morphology of the as-grown films is strongly influenced by the crystallinity and growing characteristic of the film. For low-temperature growth below the deposition temperature of 600℃, surface roughness of the BaTiO_3 film is strongly dependent on growth temperature rather than crystallinity of the films related to substrates.
- 社団法人応用物理学会の論文
- 1994-07-15
著者
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Yoon Young
Department of Electrical & Electronic Engineering, Yonsei University
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Yoon Young-ku
Department Of Nuclear Engineering Korea Advanced Institute Of Science And Technology
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Yoon Y
Inha Univ. Inchon Kor
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Lee Jeong
Department Of Clothing And Textiles Gyeongsang National University
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YOM Sang
Korea Institute of Science and Technology, Applied Physics Laboratory
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Yom S
Korea Institute Of Science And Technology Applied Physics Laboratory
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Yoon Young
Department Of Advanced Technology Fusion Konkuk University
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Lee Jeong
Department Of Anesthesiology And Pain Medicine Yonsei University College Of Medicine
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Yoon Young
Department of Advanced Technology Fusion (DATF), Konkuk University, 1 Hwayang-dong, Gwangjin-gu, Seoul 143-701, Korea
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