Effects of the Annealing in Ar and H_2/Ar Ambients on the Microstructure and the Electrical Resistivity of the Copper Film Prepared by Chemical Vapor Deposition

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1996-11-15

著者

• Lee Seung-yun

  Department Of Anesthesiology And Pain Medicine Konkuk University Hospital

• Lee S‐y

  Yonsei Univ. Seoul Kor

• Kim D‐w

  Massachusetts Inst. Technol. Ma Usa

• KIM Dong-Won

  Department of Electrical Engineering and Institute for Nano Science, Korea University

• Lee W‐j

  Sejong Univ. Seoul Kor

• Kim D‐w

  Sun Moon Univ. Chung‐nam Kor

• Kim Dong-won

  School Of Mechanical Engineering Sungkyunkwan University

• Kim Dong-won

  Department Of Advanced Materials Engineering Kyonggi University

• RHA Sa-Kyun

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• PARK Chong-Ook

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• LEE Won-Jun

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• CHUN Soung-Soon

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• Chun S‐s

  Korea Advanced Inst. Sci. And Technol. Taejon Kor

• Chun Soung-soon

  Department Of Materials Science And Engineering Kaist

• Lee W‐j

  Department Of Advanced Materials Engineering Sejong University

• Park Chong-ook

  Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology

• Rha S‐k

  Department Of Materials Engineering Hanbat National University

• Rha Sa-kyun

  Department Of Materials Engineering Hanbat National University

• Lee Won-jun

  Department Of Advanced Materials Engineering Sejong University

• Park Chong-ook

  Department Of Materials Science And Engineering Kaist

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