Atomic Layer Deposition of TiN Films by Alternate Supply of Tetrakis (ethylmethylamino)-Titanium and Ammonia
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概要
- 論文の詳細を見る
- 1998-09-15
著者
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Kang S‐w
Korea Advanced Inst. Sci. And Technol. Taejon Kor
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CHUN Soung-Soon
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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Chun Soung-soon
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Chun Soung-soon
Department Of Materials Science And Engineering Kaist
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Kang Sang-won
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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MIN Jae-Sik
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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SON Young-Woong
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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KANG Won-Gu
GeniTech. Inc.
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Min Jae-sik
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Kang Sang-won
Department Of Information And Communication Engineering Korea University
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Son Young-woong
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
関連論文
- Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN
- Atomic Layer Deposition of TiN Films by Alternate Supply of Tetrakis (ethylmethylamino)-Titanium and Ammonia
- Effects of the Annealing in Ar and H_2/Ar Ambients on the Microstructure and the Electrical Resistivity of the Copper Film Prepared by Chemical Vapor Deposition
- The Effects of Substrate Temperature and Lead Precursor Flow Rate on the Fabrication of (Pb,La)(Zr,Ti)O_3 Thin Films by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition
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- Formation of TiO2 Thin Films using NH3 as Catalyst by Metalorganic Chemical Vapor Deposition
- Comparison of Tantalum Nitride Films for Different NH3/H2/Ar Reactant States in Two-Step Atomic Layer Deposition
- Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN