Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN
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概要
- 論文の詳細を見る
- 2000-06-15
著者
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Lee H‐b
Lg Electronics Seoul Kor
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Ahn Seong-deok
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Kang Sang-won
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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LEE Hyun-Bae
Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology
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Kang Sang-won
Department Of Information And Communication Engineering Korea University
関連論文
- Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN
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- Formation of TiO2 Thin Films using NH3 as Catalyst by Metalorganic Chemical Vapor Deposition
- Comparison of Tantalum Nitride Films for Different NH3/H2/Ar Reactant States in Two-Step Atomic Layer Deposition
- Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN