Pt/RuO_2 Hybrid Bottom Electrodes and Their Effects on the Electrical Properties of (Ba, Sr)TiO_3 Thin Films

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-03-15

著者

• Lee Won-jae

  Electronics And Telecommunications Research Institute

• Lee Won-Jae

  Semiconductor Division, ETRI,

• Lee Won-jae

  Research Center For Electronic Ceramics (rcec) Department Of Advanced Materials Engineering Dong-eui

• Kim H‐g

  Korea Advanced Inst. Sci. And Technol. Taejon Kor

• KIM Ho-Gi

  Department of Materials Engineering, Korea Advanced Institute of Science and Technology

• Lee W‐j

  Sejong Univ. Seoul Kor

• Lee Won-jae

  Electronic Ceramic Materials Research Center Korea Advanced Institute Of Science And Technology

• Lee Won-jae

  Micro-electronics Laboratory Electronics And Telecommunications Research Institute

• AHN Joon-Hyung

  Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology

• Ahn Joon-hyung

  Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology

• Kim Ho-gi

  Department Of Ceramic Science And Engineering Korea Advanced Institute Of Science And Technology

• CHOI Gwang-Pyo

  Department of Materials Science and Engineering, KAIST

• Choi G‐p

  Chosun Univ. Gwangju Kor

• Choi Gwang-pyo

  Department Of Materials Science And Engineering Kaist

関連論文

• Etching Behavior and Damage Recovery of SrBi_2Ta_2O_9 Thin Films
• The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM
• The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM
• The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM
• Electrical Properties of SrBi_2Ta_2O_9/Insulator/Si Structures with Various Insulators
• Formation of Ferroelectric Thin Films for MFIS or MFMIS Structure
• Formation of Ferroelectric Thin Films for MFIS or MFMIS Structure
• Ferroelectric Properties of SrBi_2Ta_2O_9 Thin Films Deposited on Various Bottom Electrodes by a Modified Radio-Frequency Magnetron Sputtering Technique
• ED2000-68 / SDM2000-68 Calculation of polarization and mobile charge density in ferroelectric films on Si using TVS (Triangular Voltage Sweep) method
• ED2000-68 / SDM2000-68 Calculation of polarization and mobile charge density in ferroelectric films on Si using TVS (Triangular Voltage Sweep) method
• Effect of Pressure on the Incommensurate Transition in ZrTiO_4
• Effects of the Deposition Conditions of the Seed Layer on the Crystallinity and Electrical Characteristics of the Pb(Zr, Ti)O_3 Films
• Effect of Activation of Oxygen by Electron Cyclotron Resonance Plasma on the Incorporation of Pb in the Deposition of Pb(Zr,Ti)O_3 Films by DC Magnetron Reactive Sputtering
• Investigation of Pt/Ti Bottom Electrodes for Pb(Zr, Ti)O_3 Films
• A Low Operating Voltage(3V) Metal-Ferroelectric-Semiconductor(MFS)FET's Using LiNbO_3/Si(100)Structures For Nonvolatile Memory Application
• A Low Operating Voltage(3V)Metal-Ferroelectric-Semiconductor(MFS)FET's Using LiNbO_3/Si(100)Structures For Nonvolatile Memory Application
• Composition Control of Lead Zirconate Titanate Thin Films in Electron Cyclotron Resonance Plasma Enhanced Chemtical Vapor Deposition System
• Annealing of RuO_2 and Ru Bottom Electrodes and Its Effects on the Electrical Properties of (Ba,Sr)TiO_3 Thin Films
• Internal Stress Effect on the Temperature Dependence of the Dielectric and Lattice Constant in Sm-doped BaTiO_3 Ceramics
• Investigation of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using SiH_2Cl_2 and O_3 as the Precursors
• Study of Bump Formation in Integrated Chemical Vapor Deposition-Physical Vapor Deposition Aluminum Filling Process
• Effects of the Partial Pressure of Copper(I)Hexafluoroacetylacetonate Trimethylvinylsilane on the Chemical Vapor Deposition of Copper
• Effects of the Annealing in Ar and H_2/Ar Ambients on the Microstructure and the Electrical Resistivity of the Copper Film Prepared by Chemical Vapor Deposition
• Structural and Ferroelectric Properties of Sol-Get Deposited Nb-doped Pb[(Sc_Nb_)_Ti_]O_3 Thin Films
• Properties of MFSFET's with Various Gate Electrodes Using LiNbO_3/Si (100) Structures
• Properties of MFSFET's with Various Gate Electrodes Using LiNbO_3/Si (100) Structures
• Properties of MFSFET's with Various Gate Electrodes Using LiNbO_3/Si (100) Structures
• Phase Formations and Electrical Properties of Bi_La_Ti_3O_ and Sm-Doped Bi_La_Sm_Ti_3O_ Thin Films with Annealing Temperature
• New High-k SrTa_2O_6 Gate Dielectrics Prepared by Plasma-Enhanced Atomic Layer Chemical Vapor Deposition : Surface, interface, and Films
• SrTa_2O_6 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition : Surfaces, Interfaces, and Films
• Phase Formations and Electrical Properties of(Sr_xBa_)Bi_2Ta_2O_9 Thin Films
• Integration of Chemical Vapor Deposition Aluminum and Physical Vapor Deposition Aluminum for Aluminum Plug Process of Sub-Quarter Micron Devices
• A Non-destructive Readout Single Transistor FRAM with Floating Well structures
• A Non-destructive Readout Single Transistor FRAM with Floating Well structures
• A Non-destructive Readout Single Transistor FRAM with Floating Well structures
• Growth and Characterization of (Ba_Sr_)TiO_3 Films Epitaxially Grown on (002) GaN/(0006) Al_2O_3 Electrode
• Ferromagnetism of Heteroepitaxial Zn_Cu_xO Films Grown on n-GaN Substrates
• Fabrication of P-Channel MOS TFT's on Rapid Thermal CVD Polycrystalline Silicon-Germanium Films
• PMOS Thin-Film Transistors Fabricated in RTCVD Polycrystalline Silicon Germanium Films
• Imprint of Oriented Pb(Zr,Ti)O_3 Thin Films with Oxygen Atmosphere in Cooling Process
• The Effects of Cd-Substitution Site on Sintering Behavior and Electrical Properties in Pb(Ni_Nb_)O_3-PbZrO_3-PbTiO_3 Ceramics
• Effects of Cd-substitution Site on PbO Evaporation in Pb(Ni_Nb_)O_3-PbZrO_3-PbTiO_3 Ceramics
• Piezoelectric and Dielectric Properties of Fe_2O_3-Doped 0.57Pb(Sc_Nb_)O_3-0.43PbTiO_3 Ceramic Materials
• Effects of the Interfacial Layers on the Time-Dependent Leakage Current Characteristics of (Ba,Sr)TiO_3 Thin Films
• Pt/RuO_2 Hybrid Bottom Electrodes and Their Effects on the Electrical Properties of (Ba, Sr)TiO_3 Thin Films
• Low Temperature Nucleation of the Perovskite Phase in the Deposition of Pb(Zr,Ti)0_3 Films on the Pt/SiO_2/Si Substrate by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition
• Electrical Properties and Crystal Structure of (Ba_Sr_)TiO_3 Thin Films Prepared on Pt/SiO_2/Si by RF Magnetron Sputtering
• Domain Reorientation Effects on the Temperature Dependence of Piezoelectric Properties in Pb(Zn_Nb_)O_3-PbTiO_3-PbZrO_3 Ceramics
• Effect of Annealing on Fatigue Properties of Sb-Doped Lead Zirconate Titanate Thin Films Deposited by DC Reactive Sputtering
• Effects of Interfacial States on Electrical Properties of SrBi_2Ta_2O_9 Thin Films
• Anomalous Dielectric Relaxation in Reduced LiNbO_3 Single Crystals
• Characterization of Highly Preferred Pb(Zr,Ti)O3 Thin Films on La0.5Sr0.5CoO3 and LaNi0.6Co0.4O3 Electrodes Prepared at Low Temperature
• Growth and Characterization of (Ba0.5Sr0.5)TiO3 Films Epitaxially Grown on (002) GaN/(0006) Al2O3 Electrode
• Ferromagnetism of Heteroepitaxial Zn1-xCuxO Films Grown on n-GaN Substrates
• Phase Formations and Electrical Properties of Bi3.15La0.85Ti3O12 and Sm-Doped Bi3.073La0.85Sm0.077Ti3O12 Thin Films with Annealing Temperature
• Annealing of RuO 2 and Ru Bottom Electrodes and Its Effects on the Electrical Properties of (Ba,Sr)TiO 3 Thin Films
• Internal Stress Effect on the Temperature Dependence of the Dielectric and Lattice Constant in Sm-doped BaTiO3 Ceramics

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