Annealing of RuO 2 and Ru Bottom Electrodes and Its Effects on the Electrical Properties of (Ba,Sr)TiO 3 Thin Films
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概要
- 論文の詳細を見る
Crystalline structures and surface morphologies of annealed RuO2 and Ru thin films were investigated using X-ray diffraction (XRD) and scanning electron microscopy (SEM). The annealing was performed in oxygen and argon ambient and high vacuum in the temperature range of 400–800° C. In oxygen ambient annealing, the surface morphology was drastically changed due to the evaporation of ruthenium dioxides in the form of RuO3 and RuO4. Annealed RuO2 thin film in vacuum was reduced to the Ru metal phase. The actual variation of RuO2 bottom electrodes during the deposition of (Ba,Sr)TiO3 (BST) thin films and the effects of the thermal stability of bottom electrodes on electrical properties of BST thin films deposited on RuO2/SiO2/Si were also investigated.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 1998-01-15
著者
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Lee Won-jae
Electronic Ceramic Materials Research Center Korea Advanced Institute Of Science And Technology
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Ahn Joon-hyung
Department Of Materials Science And Engineering Korea Advanced Institute Of Science And Technology
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Kim Ho-gi
Department Of Ceramic Science And Engineering Korea Advanced Institute Of Science And Technology
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Choi Won-youl
Department Of Materials Engineering Korea Advanced Institute Of Science And Technology
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Lee Won-Jae
Electronic Ceramic Materials Research Center, Korea Advanced Institute of Science and Technology,
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