The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM

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概要

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• We have investigated the etching properties of MFIS structure to fabricate Pt/SBT/NO/Si structure for the transistor gate in MFIS-FET. Etch rates of blanket platinum and SBT films and characterization of etched platinum structures using a patterned PECVD-SiO_2 mask on blanket platinum films were observed. Finally, we observed that etch rates of Pt and SBT and the etch profile were varied with various etch parameters. It was also investigated that the etching damage in SBT films during RIE process influenced on the electrical propelled of ferroelectric materials.

• 社団法人電子情報通信学会の論文
• 1999-07-23

著者

• Lee Won-jae

  Electronics And Telecommunications Research Institute

• Kim Bo

  Micro-electronics Technology Laboratory Etri

• LEE Won-Jae

  Micro-Electronics Technology Laboratory, ETRI

• KIM Shi-Ho

  Micro-Electronics Technology Laboratory, ETRI

• YOU In-Kyu

  Micro-Electronics Technology Laboratory, ETRI

• YU Byoung-Gon

  Micro-Electronics Technology Laboratory, ETRI

• Cho Chae-Ryung

  Micro-Electronics Technology Laboratory, ETRI

• Shin Chang-Ho

  Korea Advanced Institute of Science and Technology (KAIST)

• Lee Hee-Chul

  Korea Advanced Institute of Science and Technology (KAIST)

• Lee Won-jae

  Research Center For Electronic Ceramics (rcec) Department Of Advanced Materials Engineering Dong-eui

• YU Byoung-Gon

  IT Convergence and Component Laboratory, Electronics and Telecommunications Research Institute

• Yu B‐g

  It Convergence And Component Laboratory Electronics And Telecommunications Research Institute

• Yu Byoung-gon

  Electronics And Telecommunications Research Institute

• Yu Byoung-gon

  Micro-electronics Laboratory Electronics And Telecommunications Research Institute

• Kim S‐h

  Dept. Of Semiconductor Science Wonkwang University

• Cho C‐r

  Micro-electronics Technology Laboratory Etri

• Cho Chae-ryong

  Micro-electronics Laboratory Electronics And Telecommunications Research Institute

• Kim Shi-ho

  Micro-electronics Technology Laboratory Etri

• You In-kyu

  Basic Research Laboratory Electronics And Telecomunications Research Institute (etri)

• You In-kyu

  Micro-electronics Technology Lab. Etri

• Lee Won-jae

  Electronic Ceramic Materials Research Center Korea Advanced Institute Of Science And Technology

• Lee Won-jae

  Micro-electronics Laboratory Electronics And Telecommunications Research Institute

• Kim S‐h

  Wonkwang Univ. Jeonbuk Kor

• Cho Chae-ryung

  Micro-electronics Technology Laboratory Etri

• Kim B

  Micro-electronics Laboratory Electronics And Telecommunications Research Institute

• Kim Bo-woo

  Micro-electronics Laboratory Electronics And Telecommunications Research Institute

関連論文

• Etching Behavior and Damage Recovery of SrBi_2Ta_2O_9 Thin Films
• The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM
• The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM
• The Etching Behaviors of Pt/SrBi_2Ta_2O_9/NO/Si Structure for MFIS in NDRO-Type FRAM
• Electrical Properties of SrBi_2Ta_2O_9/Insulator/Si Structures with Various Insulators
• Formation of Ferroelectric Thin Films for MFIS or MFMIS Structure
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