W-Plug Common Contact with CoSi_2 Ohmic Layer for Scaled DRAM and Merged DRAM in Logic (MDL) Devices
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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Lee M‐y
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee M‐y
Semiconductor R & D Center Samsung Electronics Co. Ltd.
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Lee Myoung-bum
Ls Process Development Group Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Lee Moon-yong
Semiconductor R & D Center Samsung Electronics Co.ltd.
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Lee H‐d
Korea Res. Inst. Standards And Sci. Taejon Kor
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Kang H‐k
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Kang Ho-kyu
Process Development Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kang Ho-kyu
Samsung Electronics Co. Semiconductor R&d Center Memory Process Development Team 2
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Kang Ho-kyu
Ls Process Development Group Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kang Ho-kyu
Process Development Team Semiconductor R&d Division Samsung Electronics Ltd.
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CHOI Siyoung
L/S Process Development, Semiconductor R&D Center, Samsung Electronics Co., LTD.
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YOO Bong-Young
L/S Process Development, Semiconductor R&D Center, Samsung Electronics Co., LTD.
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LEE Hyeon-Deok
L/S Process Development, Semiconductor R&D Center, Samsung Electronics Co., LTD.
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KANG Ho-Kyu
L/S Process Development, Semiconductor R&D Center, Samsung Electronics Co., LTD.
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LEE Moon-Yong
L/S Process Development, Semiconductor R&D Center, Samsung Electronics Co., LTD.
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Yoo Bong-young
L/s Process Development Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Choi Siyoung
L/s Process Development Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kang Ho-kyu
Process Development Team Semiconductor R&d Division Samsung Electronics Co.
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Lee H‐j
Process Development Team Semiconductor R&d Center Samsung Electronics
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