Fast EM Evaluation by Highly Accelerated Current Density

概要

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A conventional electromigration (EM) test takes considerably long time because of its limited accelerating condition. Moreover, a process feedback in response to change of integration process, such as the type of metallization stack or intermetallic dielectric (IMD) is rather slow. For the quick turnaround, we evaluated a FAST EM test in which high current density was applied to Al-Cu interconnects as an accelerating factor. From the trend of activation energy (Q), current density factor (n), joule heating, and failure behavior as a function of current density, the current densities lower than 10 MA/cm^2 were found to provide the same failure mechanism as that of a conventional test performed with a current density of 〜2 MA/cm^2. For a general application of this fast EM test, the corresponding joule heating was chosen as a criterion of the limit of current density. The fast EM method with highly accelerated current densities was proved to be a powerful tool in evaluating EM quality in a relatively short time.
社団法人電子情報通信学会の論文
1999-07-23