KANG Ho-Kyu | Semiconductor R&D Center, Samsung Electronics Co., Ltd.

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著作論文

A New, Low-Thermal-Budget Planarization Scheme for Pre-Metal Dielectric Using Electron-Beam Cured Hydrogen Silsesquioxane in Device
A Novel and Low Thermal Budget Planarization Scheme for Pre-Metal Dielectric Using Electron-Beam Cured HSQ (Hydrogen Silsesquioxane) in STC (Stacked Capacitor) DRAM
The Study on the Reaction Mechanism of HDP-SiOF Film and Inter-Metal-Dielectric Application
The Study on the Reaction Mechanism of HDP-SiOF Film and Inter-Metal-Dielectric Application
Fast EM Evaluation by Highly Accelerated Current Density
Fast EM Evaluation by Highly Accelerated Current Density
Fast EM Evaluation by Highly Accelerated Current Density
Deposition and Electrical Characterization of Very Thin SrTiO_3 Films for Ultra Large Scale Integrated Dynamic Random Access Memory Application

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