Deposition and Electrical Characterization of Very Thin SrTiO_3 Films for Ultra Large Scale Integrated Dynamic Random Access Memory Application
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-09-30
著者
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Cho Heung-jae
Memory R&d Division Hynix Semiconductor Inc.
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Lee Moon
Samsung Electronics Co. Semiconductor R&d Center Memory Process Development Team
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Lee M
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Park S
Samsung Electronics Co. Kyungki‐do Kor
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Lee Moon
Semiconductor R&d Center Samsung Electronics Co. Ltd
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Ahn Sung
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kang Chang
Samsung Electronics Co. Semiconductor R & D Center Memory Process Development Team
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Hwang Cheol
Semiconductor R&d Center Samsung Electronics Co.
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Hwang Cheol
School Of Materials Science And Engineering Seoul National University
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KANG Chang
Semiconductor R&D Center, SAMSUNG Electronics Co.
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CHO Hag-Ju
Semiconductor R&D Center, SAMSUNG Electronics Co.
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KANG Ho-Kyu
Semiconductor R&D Center, Samsung Electronics Co., Ltd.
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Lee Moon
Semiconductor R&d Samsung Electronics Co. Ltd.
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Kang H‐k
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Kang Ho-kyu
Process Development Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kang Ho-kyu
Samsung Electronics Co. Semiconductor R&d Center Memory Process Development Team 2
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Kang Ho-kyu
Ls Process Development Group Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kang Ho-kyu
Process Development Team Semiconductor R&d Division Samsung Electronics Ltd.
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PARK Soon
Semiconductor R&D Center, SAMSUNG Electronics Co.
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Cho Hag-ju
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd
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Kang Ho-kyu
Process Development Team Semiconductor R&d Division Samsung Electronics Co.
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Kang Chang
Samsung Electronics Co. Semiconductor R&d Center Memory Process Development Team 2
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Kang Chang
Semiconductor R&d Samsung Electronics Co. Ltd.
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Hwang Cheol
School of Material Science and Engineering, Seoul National University
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Kang Chang
Semiconductor Manufacturing Technology (SEMATECH), Austin, TX 78741, U.S.A.
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