Heterogeneous Particle Formation during Low Pressure Etching of Silicon Dioxide
スポンサーリンク
概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 1997-07-01
著者
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Lee Moon
Samsung Electronics Co. Semiconductor R&d Center Memory Process Development Team
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Jung C
Semiconductor R&d Samsung Electronics Co. Ltd.
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Lee M
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Kim Woo
Semiconductor Leading Edge Technologies Inc.
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Lee Moon
Semiconductor R&d Center Samsung Electronics Co. Ltd
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Kim W
Semiconductor Leading Edge Technol. Inc. Ibaraki Jpn
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YOO Won
Semiconductor R&D Center, Samsung Electronics Co.Ltd.
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NAM Byeong
Semiconductor R&D Center, Samsung Electronics Co.Ltd.
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SHIN Kyung
Semiconductor R&D Center, Samsung Electronics Co.Ltd.
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JUNG Chan
Semiconductor R&D Center, Samsung Electronics Co.Ltd.
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KOH Young
Semiconductor R&D Center, Samsung Electronics Co.Ltd.
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Lee Moon
Semiconductor R&d Samsung Electronics Co. Ltd.
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Yoo Won
Semiconductor R&d Center Samsung Electronics Co.ltd.
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Nam Byeong
Semiconductor R&d Center Samsung Electronics Co.ltd.
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Koh Y
Semiconductor R&d Center Samsung Electronics Co.ltd.
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Koh Young
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kim Woo
Semiconductor R&d Center Samsung Electronics Co.ltd.
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Shin Kyung
Semiconductor R&d Center Samsung Electronics Co.ltd.
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JUNG Chan
Semiconductor R&D Samsung Electronics Co., Ltd.
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KOH Young
Semiconductor R & D Center, Samsung Electronics Co., Ltd
関連論文
- Heterogeneous Particle Formation during Low Pressure Etching of Silicon Dioxide
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- A Process Integration of (Ba, Sr) TiO_3 Capacitor into 256M DRAM
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