Effect of ECR CVD SiO_2 Film Deposition of Ferroelectric Properties of Pt/PZT/Pt Capacitor
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概要
- 論文の詳細を見る
- 1996-08-26
著者
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Park I‐s
Storage Solution Team Dm R&d Center Samsung Electronics Co. Ltd.
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Park I
Semiconductor R & D Center Samsung Electronics Co. Ltd
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Park I
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee Moon
Samsung Electronics Co. Semiconductor R&d Center Memory Process Development Team
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Lee M
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Moon J
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee S
Kangwon National Univ. Kangwon‐do Kor
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Lee S‐m
Seoul National Univ. Seoul Kor
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Lee S
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Lee Sang
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd
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Lee S
Samsung Electronics Co. Ltd. Kyungki Kor
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Lee Moon
Semiconductor R&d Samsung Electronics Co. Ltd.
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OH Sejun
Process Development 2 Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd
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PARK In
Process Development 2 Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd
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KIM Byueng
Process Development 2 Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd
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MOON Jong
Process Development 2 Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd
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LEE Moon
Process Development 2 Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd
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Oh Sejun
Semiconductor R&d Center Samsung Electronics Co. Ltd
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Moon Jong
Semiconductor R & D Center Samsung Electronics Co. Ltd
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Kim Byung
Semiconductor R & D Center Samsung Electronics Co. Ltd
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Kim B.h.
Semiconductor R & D Center Samsung Electronics Co. Ltd
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Lee Sang
Process Development 2 Semiconductor R&d Center Samsung Electronics
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Lee S.I.
Semiconductor R&D Division, Samsung Electronics Co., Ltd.
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